CESIUM TUNGSTEN OXIDE FILM AND METHOD FOR MANUFACTURING SAME

Title:

CESIUM TUNGSTEN OXIDE FILM AND METHOD FOR MANUFACTURING SAME

Document Type and Number:

WIPO Patent Application WO/2019/058737

Kind Code:

A1

Abstract:

Provided are a cesium tungsten oxide film which has high heat ray shielding performance and transmissibility to radio waves, and a method for manufacturing a cesium tungsten oxide film with which such a film can be manufactured by a dry method. The cesium tungsten oxide film comprises cesium, tungsten, and oxygen as the main components, wherein when the atomic ratio of cesium and tungsten is Cs/W, Cs/W is 0.1 to 0.5, and the film has a hexagonal crystal structure. The method for manufacturing a cesium tungsten oxide film in which cesium, tungsten, and oxygen are the main components comprises: a film-forming step in which a film is formed using a cesium tungsten oxide target; and a heat treatment step in which the film is heat treated at a temperature of at least 400°C to less than 1000°C. Either the film-forming step or the heat treatment step is carried out in an oxygen-containing atmosphere.

Inventors:

SATO KEIICHI (JP)
ANDO ISAO (JP)

Application Number:

PCT/JP2018/027262

Publication Date:

March 28, 2019

Filing Date:

July 20, 2018

Export Citation:

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Assignee:

SUMITOMO METAL MINING CO (JP)

International Classes:

C23C14/08; C01G41/00; C03C17/245; C23C14/34; C23C14/58; C30B29/22

Domestic Patent References:

WO2017159790A1

2017-09-21

Foreign References:

JP2015199668A	2015-11-12
JP2010215451A	2010-09-30
JP2017182575A	2017-10-05
JP2018017381A	2018-02-01
JPH09107815A	1997-04-28
JP4096205B2	2008-06-04
JP2006096656A	2006-04-13
JPH0812378A	1996-01-16
JP2010180449A	2010-08-19

Other References: