Title:
CHA-DDR-BASED ZEOLITE SEPARATOR AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2023/075532
Kind Code:
A1
Abstract:
The present invention can provide a CHA-DDR-based zeolite separator, which comprises a first layer including a CHA structure and a DDR structure, and a second layer provided on the first layer and including the DDR structure, is in the form of a film having a thickness of 100 nm - 5 ㎛, and includes the CHA structure and the DDR structure.
Inventors:
CHOI JUNG-KYU (KR)
LEE KWAN-YOUNG (KR)
JEONG YANG-HWAN (KR)
KIM SE-JIN (KR)
LEE KWAN-YOUNG (KR)
JEONG YANG-HWAN (KR)
KIM SE-JIN (KR)
Application Number:
PCT/KR2022/016775
Publication Date:
May 04, 2023
Filing Date:
October 31, 2022
Export Citation:
Assignee:
UNIV KOREA RES & BUS FOUND (KR)
International Classes:
B01D71/02; B01D53/22; B01D67/00; B01D69/10; B01D69/12
Foreign References:
| KR102115301B1 | 2020-05-26 | |||
| US20140331860A1 | 2014-11-13 | |||
| US20160175759A1 | 2016-06-23 | |||
| JP2017170444A | 2017-09-28 | |||
| KR20200082096A | 2020-07-08 | |||
| KR20180079925A | 2018-07-11 |
Attorney, Agent or Firm:
CHOI, Hoon-Sik (KR)
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