Title:
CHALCOGEN-BASED DIAMINE, POLYAMIC ACID AND POLYIMIDE PRODUCED THEREFROM, AND POLYIMIDE FILM COMPRISING POLYIMIDE
Document Type and Number:
WIPO Patent Application WO/2020/071782
Kind Code:
A1
Abstract:
The present invention provides a polyamic acid which is a product of a polymerization reaction of a chalcogen-based diamine represented by chemical formula 1 and an acid dianhydride, a polyimide obtained therefrom, a polyimide film, and a chalcogen-based diamine. [Chemical formula 1] In chemical formula 1, X1 is selenium dioxide (SeO2), tellurium (Te), tellurium dioxide (TeO2), or a combination thereof, and Ar1 and Ar2 are each independently selected from the group consisting of chemical formula 1-1 to chemical formula 1-3. [Chemical formula 1-1] [Chemical formula 1-2] [Chemical formula 1-3] In chemical formulas 1-1 to 1-3, * represents a binding site, and R1 to R4 are each independently selected from the group consisting of hydrogen, fluorine, C1-C30 alkyl groups, and C1-C30 perfluoroalkyl groups.
Inventors:
KIM HYEONIL (KR)
GOH MUNJU (KR)
KU BON-CHEOL (KR)
JANG SE GYU (KR)
YU JAESANG (KR)
YOU NAM HO (KR)
GOH MUNJU (KR)
KU BON-CHEOL (KR)
JANG SE GYU (KR)
YU JAESANG (KR)
YOU NAM HO (KR)
Application Number:
PCT/KR2019/012904
Publication Date:
April 09, 2020
Filing Date:
October 02, 2019
Export Citation:
Assignee:
KOREA INST SCI & TECH (KR)
International Classes:
C08G73/10; C07C391/02; C07C395/00; C08J5/18; C08L79/08
Domestic Patent References:
WO2018072291A1 | 2018-04-26 |
Foreign References:
JP2004131684A | 2004-04-30 | |||
KR20080089238A | 2008-10-06 |
Other References:
A L-RUBAIE, A. Z. ET AL.: "Synthesis and Polycondensation of Some New Organic Tellurium Compounds Containing Mono- and Di-amino Groups", APPLIED ORGANOMETALLIC CHEMISTRY, vol. 12, 1998, pages 79 - 85, XP055699734
ZHANG, S. ET AL.: "Catalyst free one-pot synthesis of symmetrical diaryl tellurides with Te0/KOH", TETRAHEDRON LETTERS, vol. 54, no. 20, 2013, pages 2452 - 2454, XP028530176, DOI: 10.1016/j.tetlet.2013.02.084
ZHANG, S. ET AL.: "Catalyst free one-pot synthesis of symmetrical diaryl tellurides with Te0/KOH", TETRAHEDRON LETTERS, vol. 54, no. 20, 2013, pages 2452 - 2454, XP028530176, DOI: 10.1016/j.tetlet.2013.02.084
Attorney, Agent or Firm:
Y.P.LEE, MOCK & PARTNERS (KR)
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