Title:
CHAMBER CLEANING DEVICE AND CHAMBER CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2019/156489
Kind Code:
A1
Abstract:
The present invention relates to a chamber cleaning device and a chamber cleaning method and, more specifically, to a chamber cleaning device and a chamber cleaning method, which can clean a chamber contaminated during the deposition of a thin film on a substrate. A camber cleaning method according to an embodiment of the present invention is a method for cleaning a chamber in which zinc oxide is deposited, the method comprising the steps of: supplying a chlorine (Cl)-containing gas and a hydrogen (H)-containing gas into the chamber; activating and reacting the separately supplied gases in the chamber to produce a reaction gas; and primarily cleaning the chamber with the reaction gas.
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Inventors:
LEE DONG HWAN (KR)
KIM JAE HO (KR)
KIM HYUN IL (KR)
YUN HO JIN (KR)
LEE JAE WAN (KR)
LIM BYUNG GWAN (KR)
KIM JAE HO (KR)
KIM HYUN IL (KR)
YUN HO JIN (KR)
LEE JAE WAN (KR)
LIM BYUNG GWAN (KR)
Application Number:
PCT/KR2019/001547
Publication Date:
August 15, 2019
Filing Date:
February 07, 2019
Export Citation:
Assignee:
JUSUNG ENG CO LTD (KR)
International Classes:
H01L21/02; H01L21/67
Foreign References:
| US20110223710A1 | 2011-09-15 | |||
| KR20130142972A | 2013-12-30 | |||
| KR100785443B1 | 2007-12-13 | |||
| KR20110074912A | 2011-07-04 | |||
| US20080115808A1 | 2008-05-22 |
Attorney, Agent or Firm:
NAM, Seung-Hee (KR)
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