Title:
CHARGED PARTICLE BEAM APPARATUS, AND METHOD FOR CONTROLLING SAME
Document Type and Number:
WIPO Patent Application WO/2020/144838
Kind Code:
A1
Abstract:
This charged particle beam apparatus comprises: a movement mechanism that holds and moves a sample; a charged particle source that emits charged particles with which the sample is irradiated in order to acquire an image of the sample; and a control unit that controls the movement mechanism to move the sample and acquire the image of the sample. The control unit acquires a reference image formed by the charged particles of the sample in a reference placement state, generates, from the reference image, a goal image of the sample in a target placement state different from the reference placement state by computation, moves the sample to a plurality of different placement states by the movement mechanism, acquires candidate images formed by the charged particles of the sample in the plurality of different placement states, respectively, and generates comparison results between the respective candidate images and the goal image.
Inventors:
DOBASHI TAKASHI (JP)
TAMAKI HIROKAZU (JP)
MISE HIROMI (JP)
TAMAKI HIROKAZU (JP)
MISE HIROMI (JP)
Application Number:
PCT/JP2019/000643
Publication Date:
July 16, 2020
Filing Date:
January 11, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/22; H01J37/20; H01J37/24
Foreign References:
| JP2003287508A | 2003-10-10 | |||
| JPH11111207A | 1999-04-23 |
Attorney, Agent or Firm:
TOU-OU PATENT FIRM (JP)
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