Title:
CHARGED PARTICLE BEAM APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/118594
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a charged particle beam apparatus, wherein static electricity is effectively removed from an electrostatic chuck.
In order to achieve the purpose, the present invention provides a charged particle beam apparatus that is provided with a sample chamber, in which a space having an electrostatic chuck mechanism (5) therein is maintained in a vacuum state. The charged particle beam apparatus is characterized in that: the apparatus is provided with an ultraviolet light source (6) for irradiating the inside of the sample chamber with ultraviolet light, and a member to be irradiated with the ultraviolet light; and that the member is disposed in the perpendicular line direction of an attracting surface of the electrostatic chuck.
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Inventors:
EBIZUKA YASUSHI (JP)
KANNO SEIICHIRO (JP)
NISHIHARA MAKOTO (JP)
FUJITA MASASHI (JP)
KANNO SEIICHIRO (JP)
NISHIHARA MAKOTO (JP)
FUJITA MASASHI (JP)
Application Number:
PCT/JP2013/051693
Publication Date:
August 15, 2013
Filing Date:
January 28, 2013
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/20
Foreign References:
| JPH11354621A | 1999-12-24 | |||
| JPH1027566A | 1998-01-27 | |||
| JPH06188305A | 1994-07-08 | |||
| JPH04100257A | 1992-04-02 |
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
Manabu Inoue (JP)
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Claims: