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Patent Searching and Data


Title:
CHARGED PARTICLE BEAM APPARATUS
Document Type and Number:
WIPO Patent Application WO/2016/084872
Kind Code:
A1
Abstract:
The purpose of the present invention is to facilitate convenient observation of the three-dimensional internal structure of a sample being observed through an optical microscope with a charged particle microscope while accurately measuring the three-dimensional positional relationship and the density distribution of the sample's internal structure using an image of the charged-particles passing therethrough. A charged particle beam apparatus includes a sample stand rotating unit capable of rotating a sample stand (500) while the surface of the sample stand (500) is inclined at an angle (θ) that is not a right angle to the optical axis of a primary charged particle beam. The sample stand (500) is configured to include a detection element for detecting the charged particles scattered inside or transmitted through the sample. The charged particle beam apparatus irradiates the sample with the primary charged particle beam while the sample stand rotating unit rotates at a plurality of different angles (ϕ) in order to acquire an image of the charged-particles passing through the sample corresponding to each angle (ϕ).

Inventors:
OKUMURA TAIGA (JP)
OHSHIMA TAKASHI (JP)
OOMINAMI YUUSUKE (JP)
SHOUJI MINAMI (JP)
HISADA AKIKO (JP)
YONEYAMA AKIO (JP)
Application Number:
PCT/JP2015/083146
Publication Date:
June 02, 2016
Filing Date:
November 26, 2015
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/20; G01N23/04; H01J37/147; H01J37/22; H01J37/244; H01J37/26; H01J37/28
Foreign References:
JP2011065912A2011-03-31
JP2012155870A2012-08-16
JP2012221766A2012-11-12
Attorney, Agent or Firm:
INOUE Manabu et al. (JP)
Manabu Inoue (JP)
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