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Patent Searching and Data


Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/154705
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a charged particle beam device which suppresses sample deformation caused by placing a sample on a suctioning surface of an electrostatic chuck mechanism, the sample having a temperature different from the suctioning surface. Proposed is a charged particle beam device which has an electrostatic chuck mechanism, the charged particle beam device being provided with: a stage (200) which moves a sample, which is to be irradiated with a charged particle beam, relative to an irradiation position of the charged particle beam; an insulating body (203) which is disposed on the stage and constitutes a dielectric layer of the electrostatic chuck; a first support member (402) which supports the insulating body on the stage; a ring-shaped electrode (400) which encloses the surroundings of the sample and is installed on the insulating body in a contactless manner, and to which a predetermined voltage is applied; and a second support member (405) which supports the ring-shaped electrode.

Inventors:
TANOKUCHI Akito (24-14 Nishi Shimbashi 1-chome, Minato-k, Tokyo 17, 〒1058717, JP)
KANNO Seiichiro (24-14 Nishi Shimbashi 1-chome, Minato-k, Tokyo 17, 〒1058717, JP)
SHIBAYAMA Kei (Ichige Hitachinakash, Ibaraki 33, 〒3120033, JP)
Application Number:
JP2017/007084
Publication Date:
August 30, 2018
Filing Date:
February 24, 2017
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
International Classes:
H01J37/20
Foreign References:
JP2012064567A2012-03-29
JP2013101974A2013-05-23
JP3155802U2009-12-03
Attorney, Agent or Firm:
TODA Yuji (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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