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Title:
CHARGED-PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/154706
Kind Code:
A1
Abstract:
The objective of the present invention is to provide a charged-particle beam device wherein suppressing the effects of static build-up is compatible with performing high-throughput measurements and examination. In order to achieve this objective, proposed is the charged-particle beam device equipped with an electrostatic chuck (803), comprising an electrometer (11) for measuring the electric potential of the electrostatic chuck, a charge removing device (805) for removing charge from the electrostatic chuck, and a control device (806) for controlling the charge removing device in such a manner that the charge removal by the charge removing device is executed after reaching a certain number of processed samples irradiated by the charged particle beam, or after a predetermined processing time. When the result of the electric potential measurement by the electrometer does not meet a predetermined condition, the control device executes at least one among increasing and decreasing the number processed or the processing time.

Inventors:
KANNO Seiichiro (24-14 Nishi Shimbashi 1-chome, Minato-k, Tokyo 17, 〒1058717, JP)
ANDOU Hiroyuki (24-14 Nishi Shimbashi 1-chome, Minato-k, Tokyo 17, 〒1058717, JP)
Application Number:
JP2017/007085
Publication Date:
August 30, 2018
Filing Date:
February 24, 2017
Export Citation:
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Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
International Classes:
H01J37/20
Domestic Patent References:
WO2015163036A12015-10-29
Foreign References:
JP2014137905A2014-07-28
JP2007053405A2007-03-01
Attorney, Agent or Firm:
TODA Yuji (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
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