Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/220809
Kind Code:
A1
Abstract:
The present invention makes it possible to detect high-energy signal electrons that pass through the vicinity of an optical axis, e.g., backscattered electrons (BSE) or secondary electrons (SE) in a booster optical system. For this purpose, provided is a charged particle beam device having a charged particle beam source 101 for generating a charged particle beam, an objective lens 105 for focusing the charged particle beam onto a sample, and a charged particle detection element 108 that is disposed between the charged particle beam source 101 and the objective lens 105 and detects charged particles produced due to the interaction between the charged particle beam and the sample, wherein the detection surface of the charged particle detection element 108 is disposed on the center axis of the objective lens 105.
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Inventors:
NOMAGUCHI TSUNENORI (JP)
MOTOMURA SHUNICHI (JP)
NISHINAKA KENICHI (JP)
AGEMURA TOSHIHIDE (JP)
MOTOMURA SHUNICHI (JP)
NISHINAKA KENICHI (JP)
AGEMURA TOSHIHIDE (JP)
Application Number:
PCT/JP2017/020555
Publication Date:
December 06, 2018
Filing Date:
June 02, 2017
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/244; H01J37/09
Domestic Patent References:
WO2016092642A1 | 2016-06-16 | |||
WO2002001596A1 | 2002-01-03 |
Foreign References:
JP2000030654A | 2000-01-28 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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