Title:
CHARGED-PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2019/186938
Kind Code:
A1
Abstract:
The invention addresses the problem that, if a charged-particle beam aperture that is shaped as a ring is used, the charged-particle beam portion directly on the optical axis, wherein the electric current density is highest in the charged-particle beam, is blocked, and thus, disposing the charged-particle beam aperture at an optimal placement position is difficult. This charged-particle beam device comprises a charged-particle beam source (101) generating the charged-particle beam, the charged-particle beam aperture (120), a charged-particle beam aperture power source (108) applying a voltage to the charged-particle beam aperture, an objective lens (105) focusing the charged-particle beam onto a sample, a detector (118) detecting a secondary charged particle which has been released due to the sample being irradiated by the charged-particle beam, and a computer (170) forming a charged-particle beam image on the basis of the secondary charged particle detected by the detector. The position of the charged-particle beam aperture is set in such a manner that, in a state wherein an alternating current voltage is applied to the charged-particle beam aperture by the charged-particle beam aperture power source, changes occur in concentric circular shapes synchronized with the alternating current voltage, without displacement of the charged-particle beam image.
Inventors:
NISHINAKA KENICHI (JP)
NOMAGUCHI TSUNENORI (JP)
NOMAGUCHI TSUNENORI (JP)
Application Number:
PCT/JP2018/013398
Publication Date:
October 03, 2019
Filing Date:
March 29, 2018
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/09
Domestic Patent References:
| WO2016174891A1 | 2016-11-03 |
Foreign References:
| JPH0521033A | 1993-01-29 | |||
| JP2000077018A | 2000-03-14 | |||
| JP2001015059A | 2001-01-19 | |||
| JPS5998447A | 1984-06-06 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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