Title:
CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2021/001919
Kind Code:
A1
Abstract:
In a charged particle beam device comprising: an objective lens that generates a magnetic field near a specimen; and a booster electrode, an insulator is disposed between the magnetic field lens and the booster electrode, with a tip portion of the insulator protruding further to a tip side of a lower flux path than a tip of an upper flux path of the magnetic field lens, in order to provide a charged particle beam device in which ion discharge can be prevented. Moreover, a lower-side tip of the insulator is situated further toward an upper side than the lower flux path, and a metal electrode of a non-magnetic material fills in between the upper flux path and the lower flux path.
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Inventors:
SAKAKIBARA MAKOTO (JP)
ENYAMA MOMOYO (JP)
KAWANO HAJIME (JP)
SUZUKI MAKOTO (JP)
TANIMOTO KENJI (JP)
SASAKI YUKO (JP)
ENYAMA MOMOYO (JP)
KAWANO HAJIME (JP)
SUZUKI MAKOTO (JP)
TANIMOTO KENJI (JP)
SASAKI YUKO (JP)
Application Number:
PCT/JP2019/026275
Publication Date:
January 07, 2021
Filing Date:
July 02, 2019
Export Citation:
Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J37/04; H01J37/147
Domestic Patent References:
WO2014069271A1 | 2014-05-08 |
Foreign References:
JP2013058314A | 2013-03-28 | |||
JP2001243904A | 2001-09-07 | |||
JP2007311117A | 2007-11-29 | |||
JP2005317558A | 2005-11-10 | |||
JPH02297852A | 1990-12-10 |
Attorney, Agent or Firm:
POLAIRE I.P.C. (JP)
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