Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CHARGED PARTICLE BEAM EMITTING DEVICE
Document Type and Number:
WIPO Patent Application WO/2012/014370
Kind Code:
A1
Abstract:
In accelerating tubes that use conductive insulators, the dopant density on the surface becomes non-uniform, which may make the surface resistance of the conductive insulator non-uniform. The problem addressed by the present invention is to maintain the electric potential distribution on the inner surface in the vertical direction constant without regard to the circumferential direction, even in such cases. A number of circular grooves are provided on the inner surface of the conductive insulator accelerating tube and a metal is metallized along the inside of the grooves. Since the electrical potential of the metallized region on the inner surface of the accelerating tube is uniform even if the resistance of a particular portion of the inner surface of the accelerating tube is different from the surrounding surface, the electrical potential distribution in the vertical direction on the inner surface of the accelerating tube can be maintained at approximately the same potential without regard to the circumferential direction. As a result, there is no horizontal force acting on the electron beam that passes through the center axis, electrical potential gradient is also maintained almost constant, and aberration reduction can be achieved.

More Like This:
Inventors:
WATANABE, Shunichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
渡辺 俊一 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
ONISHI, Takashi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
大西 崇 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
Application Number:
JP2011/003394
Publication Date:
February 02, 2012
Filing Date:
June 15, 2011
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社 日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目24番14号 Tokyo, 〒1058717, JP)
WATANABE, Shunichi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
渡辺 俊一 (〒04 茨城県ひたちなか市大字市毛882番地 株式会社 日立ハイテクノロジーズ 那珂事業所内 Ibaraki, 〒3128504, JP)
ONISHI, Takashi (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Oaza Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
International Classes:
H01J37/065; H01J37/07
Attorney, Agent or Firm:
INOUE, Manabu et al. (6-1, Marunouchi 1-chome, Chiyoda-k, Tokyo 20, 〒1008220, JP)
Download PDF:
Claims: