Title:
CHARGED PARTICLE BEAM EQUIPMENT AND METHOD FOR ADJUSTING AXIS OF APERTURE
Document Type and Number:
WIPO Patent Application WO/2008/023559
Kind Code:
A1
Abstract:
Charged particle beam equipment in which the position of the central axis of an aperture
can be adjusted easily with high precision in a short time, and a method for adjusting
the axis of an aperture. The charged particle beam equipment (1) comprises a charged
particle source (9), an aperture (18), an objective lens (12), an observation
means (32), an aperture drive section (19), and a control section (30). The control
section (30) comprises a spot pattern forming means (33) for forming a plurality
of spot patterns on the surface (N1) of a sample (N) by irradiating it with a charged
particle beam (I), an analysis means (34) for calculating the position of spot
center of a spot pattern and the geometrical central position of halo, and a adjustment
position determining means (35) for calculating an adjustment position based
on a position where the lines connecting the positions of spot centers in individual
spot patterns with the central positions of halos intersect. Position of the
aperture (18) is adjusted by shifting the central axis of the aperture (18) to
the adjustment position.
More Like This:
| JP61064058 | HEAT TREATMENT DEVICE BY LINEAR ELECTRON BEAM |
| WO/2007/114120 | ION IMPLANTER |
| JP2005235665 | DARK FIELD SCANNING TRANSMISSION ELECTRON MICROSCOPE AND OBSERVATION METHOD |
Inventors:
OGAWA, Takashi (8 Nakase 1-chome, Mihama-k, Chiba-shi Chiba 07, 2618507, JP)
小川 貴志 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 エスアイアイ・ナノテクノロジー株式会社内 Chiba, 2618507, JP)
YAMAMOTO, Yo (8 Nakase 1-chome, Mihama-k, Chiba-shi Chiba 07, 2618507, JP)
小川 貴志 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 エスアイアイ・ナノテクノロジー株式会社内 Chiba, 2618507, JP)
YAMAMOTO, Yo (8 Nakase 1-chome, Mihama-k, Chiba-shi Chiba 07, 2618507, JP)
Application Number:
JP2007/065237
Publication Date:
February 28, 2008
Filing Date:
August 03, 2007
Export Citation:
Assignee:
SII NANOTECHNOLOGY INC. (8 Nakase 1-chome, Mihama-ku Chiba-shi Chiba, 07, 2618507, JP)
エスアイアイ・ナノテクノロジー株式会社 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 Chiba, 2618507, JP)
OGAWA, Takashi (8 Nakase 1-chome, Mihama-k, Chiba-shi Chiba 07, 2618507, JP)
小川 貴志 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 エスアイアイ・ナノテクノロジー株式会社内 Chiba, 2618507, JP)
エスアイアイ・ナノテクノロジー株式会社 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 Chiba, 2618507, JP)
OGAWA, Takashi (8 Nakase 1-chome, Mihama-k, Chiba-shi Chiba 07, 2618507, JP)
小川 貴志 (〒07 千葉県千葉市美浜区中瀬１丁目８番地 エスアイアイ・ナノテクノロジー株式会社内 Chiba, 2618507, JP)
International Classes:
H01J37/09; H01J37/04; H01J37/317; H01J37/09; H01J37/04; H01J37/317
Attorney, Agent or Firm:
MATSUSHITA, Yoshiharu (AIOS Hiroo Building 807, 11-2 Hiroo 1-chome, Shibuya-ku Tokyo 12, 1500012, JP)
Download PDF: