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Title:
CHARGED PARTICLE BEAM OPTICAL APPARATUS, EXPOSURE APPARATUS, EXPOSURE METHOD, CONTROL APPARATUS, CONTROL METHOD, INFORMATION GENERATION APPARATUS, INFORMATION GENERATION METHOD, AND DEVICE MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/167922
Kind Code:
A1
Abstract:
A charged particle beam optical apparatus EX is provided with: a plurality of irradiation optical systems 12 capable of irradiating an object W with charged particle beams EB, respectively; and a first control apparatus 3 that controls a second irradiation optical system 12j on the basis of the operation state of a first irradiation optical system 12i.

Inventors:
NAGASAKA, Hiroyuki (15-3 Konan 2-chome, Minato-k, Tokyo 90, 〒1086290, JP)
Application Number:
JP2017/010734
Publication Date:
September 20, 2018
Filing Date:
March 16, 2017
Export Citation:
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Assignee:
NIKON CORPORATION (15-3, Konan 2-chome Minato-k, Tokyo 90, 〒1086290, JP)
International Classes:
H01L21/027; G03F7/20; H01J37/305
Foreign References:
JP2002151399A2002-05-24
JP2002260988A2002-09-13
JPH01307222A1989-12-12
JP2002158156A2002-05-31
JP2013055144A2013-03-21
JP2007329220A2007-12-20
JPH07142316A1995-06-02
Attorney, Agent or Firm:
EGAMI, Tatsuo (3rd Floor Oak Building Kyobashi, 16-10, Kyobashi 1-chome, Chuou-k, Tokyo 31, 〒1040031, JP)
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