Title:
CHARGED PARTICLE BEAM RENDERING METHOD, CHARGED PARTICLE BEAM RENDERING DEVICE, AND ADJUSTMENT METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2022/153932
Kind Code:
A1
Abstract:
The present invention efficiently measures and corrects a deviation amount between a column center position and a center position of a mask on a stage. An adjustment method for a charged particle beam rendering device according to one aspect of the present invention comprises: a step for transporting a substrate for rendering to a rendering chamber and placing the substrate on a stage; a step for irradiating a specific mark provided on the stage with a charged particle beam from an optical lens barrel installed in the rendering chamber, and measuring the coordinates of the specific mark, such coordinates being with reference to the optical lens barrel; a step for storing first coordinates of the specific mark measured before an event; a step for calculating a difference between the stored first coordinates and second coordinates of the specific mark measured after the event; and a step for correcting coordinates of the substrate on the basis of the difference.
Inventors:
NAKANISHI KOICHI (JP)
IDENO KEITA (JP)
IDENO KEITA (JP)
Application Number:
PCT/JP2022/000328
Publication Date:
July 21, 2022
Filing Date:
January 07, 2022
Export Citation:
Assignee:
NUFLARE TECHNOLOGY INC (JP)
International Classes:
H01J37/305; G03F7/20; H01L21/027; H01L21/68
Foreign References:
| JP2012004461A | 2012-01-05 | |||
| JP2018173663A | 2018-11-08 | |||
| JP2010074110A | 2010-04-02 | |||
| JP2001274058A | 2001-10-05 |
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi et al. (JP)
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