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Patent Searching and Data


Title:
CHARGED PARTICLE SOURCE AND CHARGED PARTICLE BEAM DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/115825
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a charged particle source that exhibits small energy dispersion for charged particle beams emitted under a high angular current density condition and allows stable acquisition of large charged particle currents even for a small light source diameter. A charged particle source according to the present invention has a spherical virtual cathode surface from which charged particles are emitted, and the virtual cathode surface for charged particles emitted from a first position on the tip end surface of an emitter and the virtual cathode surface for charged particles emitted from a second position on the tip end surface of the emitter match each other (See Fig. 4).

Inventors:
FUKUTA MASAHIRO (JP)
HONDA KAZUHIRO (JP)
Application Number:
PCT/JP2018/044634
Publication Date:
June 11, 2020
Filing Date:
December 05, 2018
Export Citation:
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Assignee:
HITACHI HIGH TECH CORP (JP)
International Classes:
H01J9/02; H01J1/304; H01J37/06; H01J37/073
Foreign References:
JPH07105834A1995-04-21
JPH0836981A1996-02-06
JPH1074446A1998-03-17
JP2005339922A2005-12-08
Attorney, Agent or Firm:
HIRAKI & ASSOCIATES (JP)
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