Title:
CHEMICAL APPARATUS-CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/162272
Kind Code:
A1
Abstract:
Provided is a chemical apparatus-cleaning method that is able to remove trace amounts of metal components that remain in the system to such an extent that the chemical apparatus can be diverted to other reaction conditions and uses. The chemical apparatus-cleaning method is characterized in that it comprises a process of removing metal components by supplying a liquid containing an amide compound to the chemical apparatus to which said metal components are adhering.
Inventors:
ISHIDA, Tsutomu (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
石田 努 (〒17 千葉県茂原市東郷１１４４ 三井化学株式会社内 Chiba, 〒2970017, JP)
SATO, Arata (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
佐藤 新 (〒17 千葉県茂原市東郷１１４４ 三井化学株式会社内 Chiba, 〒2970017, JP)
石田 努 (〒17 千葉県茂原市東郷１１４４ 三井化学株式会社内 Chiba, 〒2970017, JP)
SATO, Arata (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
佐藤 新 (〒17 千葉県茂原市東郷１１４４ 三井化学株式会社内 Chiba, 〒2970017, JP)
Application Number:
JP2011/064204
Publication Date:
December 29, 2011
Filing Date:
June 22, 2011
Export Citation:
Assignee:
MITSUI CHEMICALS, INC. (5-2 Higashi-Shimbashi 1-chome, Minato-ku Tokyo, 17, 〒1057117, JP)
三井化学株式会社 (〒17 東京都港区東新橋一丁目５番２号 Tokyo, 〒1057117, JP)
ISHIDA, Tsutomu (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
石田 努 (〒17 千葉県茂原市東郷１１４４ 三井化学株式会社内 Chiba, 〒2970017, JP)
SATO, Arata (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
三井化学株式会社 (〒17 東京都港区東新橋一丁目５番２号 Tokyo, 〒1057117, JP)
ISHIDA, Tsutomu (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
石田 努 (〒17 千葉県茂原市東郷１１４４ 三井化学株式会社内 Chiba, 〒2970017, JP)
SATO, Arata (INC. 1144, Togo, Mobara-sh, Chiba 17, 〒2970017, JP)
International Classes:
B08B3/08
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (Gotanda Yamazaki Bldg. 6F, 13-6, Nishigotanda 7-chome,,Shinagawa-k, Tokyo 31, 〒1410031, JP)
Claims: