Title:
CHEMICAL LIQUID, CHEMICAL LIQUID HOUSING BODY, RESIST PATTERN FORMATION METHOD, AND PRODUCTION METHOD FOR SEMICONDUCTOR CHIPS
Document Type and Number:
WIPO Patent Application WO/2020/071042
Kind Code:
A1
Abstract:
Provided are a chemical liquid capable of forming a resist pattern having suppressed pattern interval variation when used as a developing solution or a rinse solution, a chemical liquid housing body, a resist pattern formation method, and a production method for semiconductor chips. This chemical liquid contains n-butyl acetate and isobutyl acetate. The n-butyl acetate content is 99.000%–99.999% by mass relative to the total mass of the chemical liquid and the isobutyl acetate content is 1.0–1,000 ppm by mass relative to the total mass of the chemical liquid.
Inventors:
KAMIMURA TETSUYA (JP)
Application Number:
PCT/JP2019/034756
Publication Date:
April 09, 2020
Filing Date:
September 04, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/32; B65D1/00; G03F7/26; H01L21/027; G03F7/038; G03F7/039
Domestic Patent References:
| WO2018062471A1 | 2018-04-05 | |||
| WO2017099121A1 | 2017-06-15 | |||
| WO2014148241A1 | 2014-09-25 |
Foreign References:
| JPH05246947A | 1993-09-24 | |||
| JP2014205668A | 2014-10-30 | |||
| JP2015084122A | 2015-04-30 | |||
| JP2015227501A | 2015-12-17 | |||
| JP2008264929A | 2008-11-06 | |||
| JP2015123351A | 2015-07-06 | |||
| JP2016138219A | 2016-08-04 | |||
| JP2013195844A | 2013-09-30 | |||
| JP2016057645A | 2016-04-21 | |||
| JP2015207006A | 2015-11-19 | |||
| JP2016188385A | 2016-11-04 | |||
| JP2017219818A | 2017-12-14 |
Other References:
See also references of EP 3862815A4
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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