Title:
CHEMICAL LIQUID AND CHEMICAL LIQUID HOUSING
Document Type and Number:
WIPO Patent Application WO/2020/071261
Kind Code:
A1
Abstract:
The present invention addresses the issue of providing: a chemical liquid having an excellent defect suppression performance, including for metal impurities; and a chemical liquid housing. This chemical liquid contains an organic solvent, organic impurities, and metal impurities. The organic impurities include phosphate ester and adipate. The mass ratio of the phosphate ester content relative to the adipate content is at least 1.
Inventors:
KAMIMURA TETSUYA (JP)
TAKAHASHI SATOMI (JP)
TAKAHASHI SATOMI (JP)
Application Number:
PCT/JP2019/038078
Publication Date:
April 09, 2020
Filing Date:
September 27, 2019
Export Citation:
Assignee:
FUJIFILM CORP (JP)
International Classes:
G03F7/32; B65D81/24; C11D7/20; C11D7/26; C11D7/36; C11D17/08; G03F7/16; H01L21/027; H01L21/304
Domestic Patent References:
| WO2018151164A1 | 2018-08-23 | |||
| WO2017170428A1 | 2017-10-05 | |||
| WO2017188296A1 | 2017-11-02 | |||
| WO2018092760A1 | 2018-05-24 | |||
| WO2010091045A2 | 2010-08-12 |
Foreign References:
| JP2018060193A | 2018-04-12 | |||
| JP2018081307A | 2018-05-24 |
Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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