Title:
CHEMICAL-MECHANICAL POLISHING COMPOSITIONS COMPRISING POLYETHYLENE IMINE
Document Type and Number:
WIPO Patent Application WO/2014/184703
Kind Code:
A3
Abstract:
Described is a chemical-mechanical polishing (CMP) composition comprising the following components: (A) surface modified silica particles having a negative zeta potential of -15 mV or below at a pH in the range of from 2 to 6 (B) one or more polyethylene imines (C) water (D) optionally one or more further constituents, wherein the pH of the composition is in the range of from 2 to 6.
Inventors:
LAN YONGQING (DE)
PRZYBYLSKI PETER (DE)
BAO ZHENYU (US)
PRÖLSS JULIAN (DE)
PRZYBYLSKI PETER (DE)
BAO ZHENYU (US)
PRÖLSS JULIAN (DE)
Application Number:
PCT/IB2014/061201
Publication Date:
March 12, 2015
Filing Date:
May 05, 2014
Export Citation:
Assignee:
BASF SE (DE)
BASF CHINA CO LTD (CN)
BASF CHINA CO LTD (CN)
International Classes:
C09G1/02; C09G1/00; C09G1/04; C09K3/14
Domestic Patent References:
| WO2006028759A2 | 2006-03-16 |
Foreign References:
| CN101899265A | 2010-12-01 | |||
| CN101451047A | 2009-06-10 | |||
| US20020123224A1 | 2002-09-05 |
Other References:
See also references of EP 2997105A4
Attorney, Agent or Firm:
BASF SE (67056 Ludwigshafen, DE)
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