Title:
CHEMICAL VAPOR DEPOSITION RAW MATERIAL COMPRISING IRIDIUM COMPLEX, AND CHEMICAL VAPOR DEPOSITION METHOD IN WHICH SAID CHEMICAL VAPOR DEPOSITION RAW MATERIAL IS USED
Document Type and Number:
WIPO Patent Application WO/2018/173724
Kind Code:
A1
Abstract:
The present invention pertains to a chemical vapor deposition raw material for producing an iridium thin film or an iridium compound thin film by a chemical vapor deposition method, wherein the chemical vapor deposition raw material comprises an iridium complex in which cyclopropenyl or a derivative thereof, and a carbonyl ligand, are coordinated to iridium. The iridium complex applied in the present invention makes it possible to produce an iridium thin film even when a reducing gas such as hydrogen is applied. (In the formula, R1 to R3, which are substituents of a cyclopropenyl ligand, each independently represent hydrogen or a C1-4 linear or branched alkyl group.)
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Inventors:
HARADA RYOSUKE (JP)
SHIGETOMI TOSHIYUKI (JP)
SUZUKI KAZUHARU (JP)
SHIGETOMI TOSHIYUKI (JP)
SUZUKI KAZUHARU (JP)
Application Number:
PCT/JP2018/008395
Publication Date:
September 27, 2018
Filing Date:
March 05, 2018
Export Citation:
Assignee:
TANAKA PRECIOUS METAL IND (JP)
International Classes:
C23C16/16; C07F15/00; C23C16/18; H01L21/285
Foreign References:
| JP2017008351A | 2017-01-12 | |||
| JP2016211049A | 2016-12-15 | |||
| JP2014037390A | 2014-02-27 | |||
| JP2005232142A | 2005-09-02 | |||
| JP2005225855A | 2005-08-25 | |||
| JP2010173979A | 2010-08-12 | |||
| JP2010504424A | 2010-02-12 |
Other References:
LICHTENBERGER, D. L. ET AL.: "Electron distribution and bonding in eta3-cyclopropenyl-metal complexes", ORGANOMETALLICS, vol. 12, 1993, pages 2025 - 2031, XP055557691
HUGHES, R. P. ET AL.: "Preparation and dynamic behavior of r]3-cyclopropenyl complexes of cobalt, rhodium, and iridium. Crystal and molecular structure of [Ir (eta3-C3tBu3) (CO) 3", ORGANOMETALLICS, vol. 12, 1993, pages 3069 - 3074, XP055557694
SHEN, J. K. ET AL.: "Kinetics of CO substitution in reactions of r]3-cyclopropenyl complexes of iron, cobalt, rhodium, and iridium with phosphorus ligands. First examples of a dissociative mechanism for CO substitution in the cobalt triad carbonyl complexes", J. AM. CHEM. SOC., vol. 115, 1993, pages 11312 - 11318
HUGHES, R. P. ET AL.: "Reversible insertion of iridium into a cyclopropencyl carbon-carbon bond", ORGANOMETALLICS, vol. 13, 1994, pages 4664 - 4666, XP055557695
HUGHES, R. P. ET AL.: "r]3-cyclopropenyl is isolobal with NO , but not with D3-propenyl(Allyl): Evidence from conformational preferences and rotational barriers in alkene and alkyne complexes of iridium", ORGANOMETALLICS, vol. 12, 1993, pages 4 736 - 4738
HUGHES, R. P. ET AL.: "Preparation and dynamic behavior of r]3-cyclopropenyl complexes of cobalt, rhodium, and iridium. Crystal and molecular structure of [Ir (eta3-C3tBu3) (CO) 3", ORGANOMETALLICS, vol. 12, 1993, pages 3069 - 3074, XP055557694
SHEN, J. K. ET AL.: "Kinetics of CO substitution in reactions of r]3-cyclopropenyl complexes of iron, cobalt, rhodium, and iridium with phosphorus ligands. First examples of a dissociative mechanism for CO substitution in the cobalt triad carbonyl complexes", J. AM. CHEM. SOC., vol. 115, 1993, pages 11312 - 11318
HUGHES, R. P. ET AL.: "Reversible insertion of iridium into a cyclopropencyl carbon-carbon bond", ORGANOMETALLICS, vol. 13, 1994, pages 4664 - 4666, XP055557695
HUGHES, R. P. ET AL.: "r]3-cyclopropenyl is isolobal with NO , but not with D3-propenyl(Allyl): Evidence from conformational preferences and rotational barriers in alkene and alkyne complexes of iridium", ORGANOMETALLICS, vol. 12, 1993, pages 4 736 - 4738
Attorney, Agent or Firm:
TANAKA AND OKAZAKI (JP)
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