CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Title:

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN

Document Type and Number:

WIPO Patent Application WO/2006/003824

Kind Code:

A1

Abstract:

A chemically amplified resist composition containing a resin component (A) exhibiting the solubility in an alkali which is changed by the reaction with an acid and an acid-generating agent component (B), which further comprises a high boiling point solvent component (X) having a boiling point of 220°C or higher.

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Inventors:

SHIMBORI HIROSHI (JP)

Application Number:

PCT/JP2005/011436

Publication Date:

January 12, 2006

Filing Date:

June 22, 2005

Export Citation:

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Assignee:

TOKYO OHKA KOGYO CO LTD (JP)
SHIMBORI HIROSHI (JP)

International Classes:

C08F212/14; G03F7/004; G03F7/039; H01L21/027; (IPC1-7): G03F7/004; C08F212/14; G03F7/039; H01L21/027

Foreign References:

JP2002091004A	2002-03-27
JP2002196496A	2002-07-12
JPH1115163A	1999-01-22
JP2001056558A	2001-02-27
JP2001312052A	2001-11-09
JPH10691075A
JP2004045513A	2004-02-12

Attorney, Agent or Firm:

Tanai, Sumio (Yaesu Chuo-ku, Tokyo, JP)

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