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Patent Searching and Data


Title:
CHIP MANUFACTURING METHOD
Document Type and Number:
WIPO Patent Application WO/2012/014716
Kind Code:
A1
Abstract:
Disclosed is a method for manufacturing a chip comprising a functional element formed on a substrate. Said method includes: a functional-element formation step in which a functional element is formed on a principal surface of a flat target object formed from silicon; a first modified-region formation step in which laser light is focused onto the target object to form a first modified region parallel to the aforementioned principal surface of the target object at a prescribed depth from said principal surface, said prescribed depth corresponding to the thickness of the aforementioned substrate; a second modified-region formation step in which laser light is focused onto the target object to form a second modified region in the thickness direction of the target object so as to connect to the first modified region, said second modified region extending from the aforementioned principal surface of the target object so as to correspond to the edges of the substrate as seen from said principal surface; and an etching step, after the first and second modified-region formation steps, in which etching is made to selectively progress along the first and second modified regions to cut out part of the target object, thereby forming the aforementioned substrate.

Inventors:
SHIMOI Hideki (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
下井 英樹 (〒58 静岡県浜松市東区市野町1126番地の1 浜松ホトニクス株式会社内 Shizuoka, 〒4358558, JP)
Application Number:
JP2011/066344
Publication Date:
February 02, 2012
Filing Date:
July 19, 2011
Export Citation:
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Assignee:
HAMAMATSU PHOTONICS K.K. (1126-1, Ichino-cho Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
浜松ホトニクス株式会社 (〒58 静岡県浜松市東区市野町1126番地の1 Shizuoka, 〒4358558, JP)
SHIMOI Hideki (1126-1 Ichino-cho, Higashi-ku, Hamamatsu-sh, Shizuoka 58, 〒4358558, JP)
International Classes:
H01L21/301; B23K26/00; B23K26/04; B23K26/38
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (SOEI PATENT AND LAW FIRM, Marunouchi MY PLAZA 9th fl. 1-1, Marunouchi 2-chome, Chiyoda-k, Tokyo 05, 〒1000005, JP)
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Claims: