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Patent Searching and Data


Title:
CHLORINE FLUORIDE SUPPLYING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/175644
Kind Code:
A1
Abstract:
Provided are a chlorine fluoride supplying device and a chlorine fluoride supplying method which are capable of stably generating chlorine fluoride (ClF) for industrial use, controlling flow rate thereof, and continuously supplying the same. This chlorine fluoride supplying method is a method for supplying chlorine fluoride that is generated by introducing a gas that includes fluorine atoms and a gas that includes chlorine atoms into a flow type heated reactor or a plasma reactor. In this chlorine fluoride supplying method, it is possible to stably generate, as well as safely continue supplying over a long period of time, chlorine fluoride, which due to the difficulties of high pressure filling thereof can only be filled into a gas container such as a cylinder in limited amounts, by reacting two or more types of gas material that can be safely liquefied and filled into a gas container or by reacting similar gas material with a solid material.

Inventors:
TAKAHASHI YOSHINAO (JP)
KATO KOREHITO (JP)
SAKURAI YOSHIMASA (JP)
TAKIZAWA HIROKI (JP)
KIKUCHI SHO (JP)
KAWAGUCHI SHINICHI (JP)
IKETANI YOSHIHIKO (JP)
SHIBUSAWA YUKINOBU (JP)
Application Number:
PCT/JP2017/012984
Publication Date:
October 12, 2017
Filing Date:
March 29, 2017
Export Citation:
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Assignee:
KANTO DENKA KOGYO KK (JP)
International Classes:
C01B7/24; C07B39/00; H01L21/3065
Foreign References:
JP2002538068A2002-11-12
JP2005531479A2005-10-20
US3446592A1969-05-27
GB676374A1952-07-23
JP2007191378A2007-08-02
JP2011026694A2011-02-10
Other References:
See also references of EP 3441362A4
Attorney, Agent or Firm:
ONO, Shinjiro et al. (JP)
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