Login| Sign Up| Help| Contact|

Patent Searching and Data


Title:
CHLOROPRENE POLYMER COMPOSITION, DIP-MOLDED ARTICLE, AND METHOD FOR PRODUCING SAID COMPOSITION AND ARTICLE
Document Type and Number:
WIPO Patent Application WO/2022/130737
Kind Code:
A1
Abstract:
A method for producing a chloroprene polymer composition which contains a chloroprene polymer, said method being equipped with a polymerization step for obtaining a polymer composition which contains a chloroprene polymer by polymerizing a monomer containing chloroprene at a polymerization rate of 20% or higher, and a mixing step for mixing said polymer composition with a rosin which contains one or more types of conjugated resin acid component selected from the group consisting of abietic acid, neoabietic acid, palustric acid, levopimaric acid, and the salts thereof, wherein the amount of rosin mixed in the mixing step is greater than 0 parts by mass and no greater than 23 parts by mass relative to 100 parts by mass of the solid content of the polymer composition.

Inventors:
KATO MASAHIRO (JP)
ITO MISAKI (JP)
KUMAGAI YUSHI (JP)
SAITO YUTAKA (JP)
Application Number:
PCT/JP2021/036498
Publication Date:
June 23, 2022
Filing Date:
October 01, 2021
Export Citation:
Click for automatic bibliography generation   Help
Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08F289/00; A41D19/00; A41D19/04; A61L29/04; C08F2/44; C08J5/02; C08L11/02; C08L93/04
Domestic Patent References:
WO2013141170A12013-09-26
WO2021006118A12021-01-14
WO2019009038A12019-01-10
WO2019009038A12019-01-10
Foreign References:
JP2004525991A2004-08-26
JP2006143826A2006-06-08
JPH11116622A1999-04-27
JP2019143002A2019-08-29
Other References:
See also references of EP 4227332A4
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
Download PDF:



 
Previous Patent: OPTICAL LINE SENSOR

Next Patent: FILM