Title:
CHLOROPRENE POLYMER COMPOSITION, MANUFACTURING METHOD THEREFOR, AND DIP-MOLDED ARTICLE
Document Type and Number:
WIPO Patent Application WO/2022/102247
Kind Code:
A1
Abstract:
Provided is a manufacturing method for a chloroprene polymer composition, said method comprising a polymerization step in which a chloroprene polymer composition containing a chloroprene polymer is obtained by polymerizing chloroprene in the presence of at least one kind of rosin acid component selected from the group consisting of rosin acid and rosinate, wherein the mass ratio B1/A1 of the total amount B1 of abietic acid, neoabietic acid, palustric acid, levopimaric acid, and salts thereof to the total amount A1 of dehydroabietic acid, pimaric acid, isopimaric acid, dihydroabietic acid, and salts thereof, in the rosin acid component, is 0.10-3.00, and the toluene insoluble content in the chloroprene polymer is 50 mass% or more.
Inventors:
ITO MISAKI (JP)
ONOZUKA MASAO (JP)
KATO MASAHIRO (JP)
ONOZUKA MASAO (JP)
KATO MASAHIRO (JP)
Application Number:
PCT/JP2021/034390
Publication Date:
May 19, 2022
Filing Date:
September 17, 2021
Export Citation:
Assignee:
DENKA COMPANY LTD (JP)
International Classes:
C08F14/14; C08F2/44; C08F36/18; C08F283/00; C08K5/09
Domestic Patent References:
| WO2017221881A1 | 2017-12-28 |
Foreign References:
| JP2010126586A | 2010-06-10 | |||
| JP2018083773A | 2018-05-31 | |||
| JP2014114342A | 2014-06-26 |
Attorney, Agent or Firm:
HASEGAWA Yoshiki et al. (JP)
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