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Title:
CHOLESTERIC LIQUID CRYSTAL LAYER PRODUCTION METHOD, CHOLESTERIC LIQUID CRYSTAL LAYER, LIQUID CRYSTAL COMPOSITION, CURED PRODUCT, OPTICALLY ANISOTROPIC BODY, AND REFLECTIVE LAYER
Document Type and Number:
WIPO Patent Application WO/2019/182052
Kind Code:
A1
Abstract:
The first aim of the present invention is to provide a cholesteric liquid crystal layer production method whereby a cholesteric liquid crystal layer having a reflective surface that is not parallel to a substrate surface can be produced using a simple method. The second aim of the present invention is to provide: a cholesteric liquid crystal layer; and an optically anisotropic body and a reflective layer that include said cholesteric liquid crystal layer. The third aim of the present invention is to provide a liquid crystal composition capable of forming the cholesteric liquid crystal layer. The fourth aim of the present invention is to provide a cured product, an optically anisotropic body, and a reflective layer that are formed using the liquid crystal composition. This cholesteric liquid crystal layer production method includes a step 1 in which the liquid crystal composition including a liquid crystal compound is used and a composition layer that fulfills conditions 1, 2, and 3 is formed upon a substrate; and a step 2 in which the liquid crystal compound in the composition layer is cholesterically oriented to the composition layer and a cholesteric liquid crystal layer is formed. Condition 1: At least some of the liquid crystal compound in the composition layer is inclined relative to the substrate surface. Condition 2: The liquid crystal compound is oriented such that the tilt angle of the liquid crystal compound in the composition layer continuously changes in the thickness direction. Condition 3: At least some of the liquid crystal compound in the composition layer is oriented perpendicular to the substrate surface.

Inventors:
KODAMA KEISUKE (JP)
KATOH SHUNYA (JP)
ICHIHASHI MITSUYOSHI (JP)
Application Number:
PCT/JP2019/011843
Publication Date:
September 26, 2019
Filing Date:
March 20, 2019
Export Citation:
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Assignee:
FUJIFILM CORP (JP)
International Classes:
G02B5/30
Domestic Patent References:
WO2014010325A12014-01-16
Foreign References:
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Attorney, Agent or Firm:
ITOH Hideaki et al. (JP)
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