CLEANING AGENT - KISHIMOTO SANGYO CO

Title:

CLEANING AGENT

Document Type and Number:

WIPO Patent Application WO/2005/052109

Kind Code:

A1

Abstract:

[PROBLEMS] Disclosed is a cleaning agent which enables to remove particles and metal impurities from a wafer surface at room temperature in a short time using a single liquid without corroding wirings, gates or the like. [MEANS FOR SOLVING PROBLEMS] The cleaning agent is an aqueous solution having a pH of 2-12 and contains a phosphoric acid, a hydrofluoric acid, an ammonia and/or an amine. Specifically, the cleaning agent contains 0.5-25 mass% of a phosphoric acid, 0.1-10 mass% of an ammonia and/or an amine, and from 5 × 10^-3 to 5.0 mass% of a hydrofluoric acid.

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Inventors:

SUGA SHIGEMASA (JP)
KAMON SHIGERU (JP)
YATA TAKASHI (JP)
TERAI AKIHIRO (JP)

Application Number:

PCT/JP2004/017403

Publication Date:

June 09, 2005

Filing Date:

November 24, 2004

Export Citation:

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Assignee:

KISHIMOTO SANGYO CO (JP)
FINE POLYMERS CORP (JP)
SUGA SHIGEMASA (JP)
KAMON SHIGERU (JP)
YATA TAKASHI (JP)
TERAI AKIHIRO (JP)

International Classes:

B08B3/08; C11D7/06; C11D7/08; C11D7/18; C11D7/32; C11D11/00; C11D17/08; H01L21/304; (IPC1-7): C11D7/08; C11D7/18; C11D7/32; C11D17/08

Domestic Patent References:

WO1997018582A1

1997-05-22

Foreign References:

JPH0848996A	1996-02-20
JPH0641770A	1994-02-15
JPH07115077A	1995-05-02
JP2001044161A	2001-02-16
JPH0745600A	1995-02-14
JPH0684866A	1994-03-25
JPH07216392A	1995-08-15

Other References: