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Patent Searching and Data


Title:
CLEANING APPARATUS AND METHOD OF CLEANING
Document Type and Number:
WIPO Patent Application WO/2007/063746
Kind Code:
A1
Abstract:
A cleaning apparatus (100) which includes a cleaning tank (110) in which a chemical liquid (112) is stored so that a work to be cleaned (W) can be immersed therein and cleaned. A reduction member (200) for reducing the content of a metallic ingredient in the chemical liquid (112) is disposed outside the cleaning tank (110). A circulation system (120) including a circulation passage (122) is disposed so that the chemical liquid (112) is circulated through the cleaning tank (110) and the reduction member (200).

Inventors:
TAMURA AKITAKE (JP)
DOBASHI KAZUYA (JP)
HAYASHI TERUYUKI (JP)
Application Number:
JP2006/323216
Publication Date:
June 07, 2007
Filing Date:
November 21, 2006
Export Citation:
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Assignee:
TOKYO ELECTRON LTD (JP)
TAMURA AKITAKE (JP)
DOBASHI KAZUYA (JP)
HAYASHI TERUYUKI (JP)
International Classes:
H01L21/304; B08B3/04
Foreign References:
JPH06151402A1994-05-31
JPS59121938A1984-07-14
JPH07136603A1995-05-30
JP2004174375A2004-06-24
JP2005066402A2005-03-17
JPH08192121A1996-07-30
Attorney, Agent or Firm:
SUZUYE, Takehiko et al. (1-12-9 Toranomo, Minato-ku Tokyo 01, JP)
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