Title:
CLEANING APPARATUS AND METHOD OF CLEANING
Document Type and Number:
WIPO Patent Application WO/2007/063746
Kind Code:
A1
Abstract:
A cleaning apparatus (100) which includes a cleaning tank (110) in which a chemical
liquid (112) is stored so that a work to be cleaned (W) can be immersed therein and
cleaned. A reduction member (200) for reducing the content of a metallic ingredient
in the chemical liquid (112) is disposed outside the cleaning tank (110). A circulation
system (120) including a circulation passage (122) is disposed so that the chemical
liquid (112) is circulated through the cleaning tank (110) and the reduction
member (200).
Inventors:
TAMURA AKITAKE (JP)
DOBASHI KAZUYA (JP)
HAYASHI TERUYUKI (JP)
DOBASHI KAZUYA (JP)
HAYASHI TERUYUKI (JP)
Application Number:
PCT/JP2006/323216
Publication Date:
June 07, 2007
Filing Date:
November 21, 2006
Export Citation:
Assignee:
TOKYO ELECTRON LTD (JP)
TAMURA AKITAKE (JP)
DOBASHI KAZUYA (JP)
HAYASHI TERUYUKI (JP)
TAMURA AKITAKE (JP)
DOBASHI KAZUYA (JP)
HAYASHI TERUYUKI (JP)
International Classes:
H01L21/304; B08B3/04
Foreign References:
| JPH06151402A | 1994-05-31 | |||
| JPS59121938A | 1984-07-14 | |||
| JPH07136603A | 1995-05-30 | |||
| JP2004174375A | 2004-06-24 | |||
| JP2005066402A | 2005-03-17 | |||
| JPH08192121A | 1996-07-30 |
Attorney, Agent or Firm:
SUZUYE, Takehiko et al. (1-12-9 Toranomo, Minato-ku Tokyo 01, JP)
Download PDF: