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Title:
CLEANING APPARATUS, AND CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2017/206694
Kind Code:
A1
Abstract:
A cleaning apparatus, and cleaning method. The cleaning apparatus is used to clean residues on a substrate. The cleaning apparatus comprises a deformation device (22) provided on the substrate (21), and an excitation device (23) used to create an excitation source for the deformation device (22), such that the deformation device (22) is deformed under the action of the excitation source, and thus drives the substrate (21) to vibrate. In this way, the present invention enables shaking residues off a substrate.

Inventors:
JING, Yangkun (No.9 Dize Rd, BDA, Beijing 6, 100176, CN)
LIU, Fei (No.9 Dize Rd, BDA, Beijing 6, 100176, CN)
XU, Zhiwei (No.9 Dize Rd, BDA, Beijing 6, 100176, CN)
CHE, Xiaopan (No.9 Dize Rd, BDA, Beijing 6, 100176, CN)
CHEN, Chuanhui (No.9 Dize Rd, BDA, Beijing 6, 100176, CN)
Application Number:
CN2017/083972
Publication Date:
December 07, 2017
Filing Date:
May 11, 2017
Export Citation:
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Assignee:
BOE TECHNOLOGY GROUP CO., LTD. (No.10 Jiuxianqiao Rd, Chaoyang District, Beijing 5, 100015, CN)
HEFEI BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. (No.2177, TongLing North RoadNew Railway Station Distric, Hefei Anhui 2, 230012, CN)
International Classes:
B08B7/02; G02F1/13; G02F1/1337
Foreign References:
CN101373706A2009-02-25
US6500268B12002-12-31
CN106076980A2016-11-09
CN101402095A2009-04-08
CN1600454A2005-03-30
CN105142808A2015-12-09
KR101388505B12014-04-23
Attorney, Agent or Firm:
DRAGON INTELLECTUAL PROPERTY LAW FIRM (10F Bldg.2, Maples International CenterNo.32 Xizhimen North Street, Haidian District, Beijing 2, 100082, CN)
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