CLEANING APPARATUS, AND CLEANING METHOD - BOE TECHNOLOGY GROUP CO LTD

Title:

CLEANING APPARATUS, AND CLEANING METHOD

Document Type and Number:

WIPO Patent Application WO/2017/206694

Kind Code:

A1

Abstract:

A cleaning apparatus, and cleaning method. The cleaning apparatus is used to clean residues on a substrate. The cleaning apparatus comprises a deformation device (22) provided on the substrate (21), and an excitation device (23) used to create an excitation source for the deformation device (22), such that the deformation device (22) is deformed under the action of the excitation source, and thus drives the substrate (21) to vibrate. In this way, the present invention enables shaking residues off a substrate.

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Inventors:

JING YANGKUN (CN)
LIU FEI (CN)
XU ZHIWEI (CN)
CHE XIAOPAN (CN)
CHEN CHUANHUI (CN)

Application Number:

PCT/CN2017/083972

Publication Date:

December 07, 2017

Filing Date:

May 11, 2017

Export Citation:

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Assignee:

BOE TECHNOLOGY GROUP CO LTD (CN)
HEFEI BOE OPTOELECTRONICS TECH (CN)

International Classes:

B08B7/02; G02F1/13; G02F1/1337

Foreign References:

CN101373706A	2009-02-25
US6500268B1	2002-12-31
CN106076980A	2016-11-09
CN101402095A	2009-04-08
CN1600454A	2005-03-30
CN105142808A	2015-12-09
KR101388505B1	2014-04-23

Attorney, Agent or Firm:

DRAGON INTELLECTUAL PROPERTY LAW FIRM (CN)

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