Title:
CLEANING CHEMICAL LIQUID SUPPLY DEVICE, CLEANING UNIT, AND RECORDING MEDIUM HAVING PROGRAM STORED THEREIN
Document Type and Number:
WIPO Patent Application WO/2018/110631
Kind Code:
A1
Abstract:
A cleaning chemical liquid supply device for supplying a cleaning chemical liquid to a cleaning device is provided with: a chemical liquid inlet; a dilution water inlet; a first chemical liquid control unit fluidically connected to the chemical liquid inlet and the dilution water inlet; and a second chemical liquid control unit fluidically connected to the chemical liquid inlet and the dilution water inlet. The first chemical liquid control unit comprises a first chemical liquid flow rate control section, a first dilution water flow rate control section, and a first mixing section. The second chemical liquid control unit comprises a second chemical liquid flow rate control section, a second dilution water flow rate control section, and a second mixing section.
Inventors:
XU HAIYANG (JP)
TOYOMASU FUJIHIKO (JP)
TOYOMASU FUJIHIKO (JP)
Application Number:
PCT/JP2017/044843
Publication Date:
June 21, 2018
Filing Date:
December 14, 2017
Export Citation:
Assignee:
EBARA CORP (JP)
International Classes:
H01L21/304
Foreign References:
| JP2016009818A | 2016-01-18 | |||
| JP2000124186A | 2000-04-28 | |||
| JP2011199256A | 2011-10-06 | |||
| JP2013059735A | 2013-04-04 | |||
| JP2002277300A | 2002-09-25 |
Attorney, Agent or Firm:
ONO, Shinjiro et al. (JP)
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