Title:
CLEANING DEVICE AND CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2010/137212
Kind Code:
A1
Abstract:
A cleaning liquid is contained in a cleaning tank (3), and an object (2) to be cleaned is immersed in the cleaning liquid. A pressure reducing means (5) reduces the pressure in the cleaning tank (3) by sucking gas in the cleaning tank (3) and discharging the gas to the outside. A heating means (7) heats the cleaning liquid within the cleaning tank (3). A gas supply means (6) introduces gas into the cleaning liquid within the cleaning tank (3) from a position below the object (2) to be cleaned. After the cleaning liquid is heated to a preset temperature by the heating means (7), the pressure within the cleaning tank (3) is reduced by the pressure reducing means (5) to boil the cleaning liquid, and the gas is introduced into the cleaning liquid by the gas supply means (6) during the boiling. By this, the cleaning liquid is fiercely boiled to increase the effect of cleaning of the object (2) to be cleaned.
Inventors:
FUJII, Shinji (7, Horie-cho, Matsuyama-sh, Ehime 96, 〒7992696, JP)
Application Number:
JP2010/001596
Publication Date:
December 02, 2010
Filing Date:
March 08, 2010
Export Citation:
Assignee:
MIURA CO., LTD. (7 Horie-cho, Matsuyama-shi Ehime, 96, 〒7992696, JP)
三浦工業株式会社 (〒96 愛媛県松山市堀江町７番地 Ehime, 〒7992696, JP)
三浦工業株式会社 (〒96 愛媛県松山市堀江町７番地 Ehime, 〒7992696, JP)
International Classes:
B08B3/10; A61B19/00
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