CLEANING DEVICE, WIRING CORRECTION DEVICE, AND CLEANING METHOD

Title:

CLEANING DEVICE, WIRING CORRECTION DEVICE, AND CLEANING METHOD

Document Type and Number:

WIPO Patent Application WO/2018/117027

Kind Code:

A1

Abstract:

A cleaning device provided with: a liquefied carbon dioxide gas jetting nozzle 12 which jets liquefied carbon dioxide gas toward a surface of a substrate to which an unwanted deposit has become attached after a wiring repair process, so as to convert the liquefied carbon dioxide gas into dry ice microparticles by adiabatic expansion; and a positioning observation camera 13 for observing a surface position and a surface state of the substrate with which the dry ice microparticles jetted from the liquefied carbon dioxide gas jetting nozzle 12 collide, thereby making it possible to identify the position of the unwanted deposit with which the dry ice microparticles collide.

Inventors:

SUZUKI YOSHIKAZU (JP)
KUSUMI YOSUKE (JP)
TANOOKA DAISUKE (JP)

Application Number:

PCT/JP2017/045331

Publication Date:

June 28, 2018

Filing Date:

December 18, 2017

Export Citation:

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Assignee:

V TECH CO LTD (JP)

International Classes:

H01L21/304; B08B7/00; C23C16/48; H01L21/3205; H01L21/768; H01L23/522

Foreign References:

JP2001015514A	2001-01-19
US7276385B1	2007-10-02
JP2003031362A	2003-01-31