Title:
CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/190203
Kind Code:
A1
Abstract:
A cleaning device for cleaning semiconductors using a cleaning solution is provided with a cleaning-solution-holding part for holding the cleaning solution, and a liquefying part connected to the cleaning-solution-holding part. The liquefying part is disposed in such a manner that, upon reaching the liquefying part from the cleaning-solution-holding part, the cleaning solution is liquefied in the liquefying part due to gasification and flows into the cleaning-solution-holding part.
Inventors:
NAGAO KENJI (JP)
NAKAMURA KENICHI (JP)
NAKAMURA KENICHI (JP)
Application Number:
PCT/JP2016/064812
Publication Date:
December 01, 2016
Filing Date:
May 19, 2016
Export Citation:
Assignee:
SUMITOMO ELECTRIC INDUSTRIES (JP)
International Classes:
H01L21/304
Foreign References:
| JPH10284456A | 1998-10-23 | |||
| JPH11274133A | 1999-10-08 | |||
| JP2012204417A | 2012-10-22 | |||
| JPH10284458A | 1998-10-23 | |||
| JP2004128102A | 2004-04-22 |
Attorney, Agent or Firm:
KITANO, Shuhei et al. (JP)
Shuhei Kitano (JP)
Shuhei Kitano (JP)
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