Title:
CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2018/037834
Kind Code:
A1
Abstract:
Provided is a cleaning device capable of cleaning a workpiece with increased cleaning effect to reduce time required for a workpiece cleaning step.
A cleaning device 10 is provided with: a cleaning chamber 12; a workpiece gripping jig 14 provided within the cleaning chamber 12 and rotating a workpiece W; a cleaning nozzle 16 provided within the cleaning chamber 12 and ejecting cleaning liquid L; a liquid discharge opening 20 for discharging to the outside of the cleaning chamber 12 the cleaning liquid L accumulated within the cleaning chamber 12; and a water discharge damper 18 for opening and closing the liquid discharge opening 20. The cleaning chamber 12 is configured in a box shape by sidewall sections 22 and a bottom wall section 24. The bottom wall section 24 is configured such that the lowermost front ends of a plurality of tilted bottom sections 26 are connected to each other. The water discharge damper 18 configures one of the plurality of tilted bottom sections 26.
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Inventors:
ICHIHASHI KAORU (JP)
FUKUI MITSURU (JP)
FUKUI MITSURU (JP)
Application Number:
PCT/JP2017/027509
Publication Date:
March 01, 2018
Filing Date:
July 28, 2017
Export Citation:
Assignee:
SHIGA YAMASHITA CO LTD (JP)
International Classes:
B08B3/04; B08B3/02; B08B3/10; C23G3/00
Foreign References:
| JP2012045499A | 2012-03-08 | |||
| JP2010194485A | 2010-09-09 | |||
| JPH07127357A | 1995-05-16 | |||
| JP2000070880A | 2000-03-07 | |||
| JP2002334863A | 2002-11-22 | |||
| JP2013138051A | 2013-07-11 |
Attorney, Agent or Firm:
NISHIMURA Tomohiro (JP)
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