Title:
CLEANING AND DRYING DEVICE
Document Type and Number:
WIPO Patent Application WO/2003/105208
Kind Code:
A1
Abstract:
A cleaning and drying device for cleaning and drying in a short time a cassette for receiving a semiconductor wafer or a resin-made container that receives electronic parts and precision machine parts when they are transported and stored. The device is compact and has considerably smaller installation area than conventionally required. A rotation drum (1) is installed in a cleaning vessel, and one or more detachable baskets (2) that receive part-receiving containers (7), etc. are installed in the rotation drum (1) or the part-receiving containers (7), etc. are directly received in the rotation drum (1). Cleaning is performed as the rotation drum (1) is rotated, after that water-removing and drying are carried out by rotating the rotation drum (1) at a high speed, and then drying with hot air is performed.
Inventors:
NOBE SHINTARO
IMAGAWA SUSUMU
IMAGAWA SUSUMU
Application Number:
PCT/JP2003/007314
Publication Date:
December 18, 2003
Filing Date:
June 10, 2003
Export Citation:
Assignee:
DAN TAKUMA TECHNOLOGIES INC (JP)
INAMOTO SEISAKUSHO KK (JP)
INAMOTO SEISAKUSHO KK (JP)
International Classes:
B08B1/00; B08B3/02; B08B3/04; B08B3/06; B08B3/08; B08B3/10; B08B3/12; C23G3/00; F26B3/06; F26B5/08; H01L21/00; H01L21/304; (IPC1-7): H01L21/304; B08B3/06
Domestic Patent References:
| WO1993026035A1 | 1993-12-23 |
Foreign References:
| JPS6079727A | 1985-05-07 | |||
| JP2001217218A | 2001-08-10 | |||
| EP0949661A2 | 1999-10-13 | |||
| JPH06159940A | 1994-06-07 | |||
| JP2000317411A | 2000-11-21 |
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