Title:
CLEANING LIQUID, SEMICONDUCTOR SUBSTRATE CLEANING METHOD, AND METAL PATTERN FORMATION METHOD
Document Type and Number:
WIPO Patent Application WO/2015/083636
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a cleaning liquid that does not substantially contain water, that exhibits excellent decomposition of organic matter, and that exhibits little corrosion of metal. The present invention achieves this purpose, is a cleaning agent that does not substantially contain water, and is characterized by: containing 2-10 mass% of a quarternary ammonium hydroxide in addition to containing a glycol and an amide-based organic solvent; and by the content (mass) of the glycol being five or more times the content (mass) of the quarternary ammonium hydroxide.
Inventors:
MORITA SHIROU (JP)
NARUSE SHINGO (JP)
KOUMURA KAZUHIKO (JP)
FUJIWARA KOUICHI (JP)
NARUSE SHINGO (JP)
KOUMURA KAZUHIKO (JP)
FUJIWARA KOUICHI (JP)
Application Number:
PCT/JP2014/081545
Publication Date:
June 11, 2015
Filing Date:
November 28, 2014
Export Citation:
Assignee:
JSR CORP (JP)
International Classes:
C11D7/32; C11D7/26; C11D17/08; G03F7/42; H01L21/304
Foreign References:
| JPH05504204A | 1993-07-01 | |||
| JP2006317714A | 2006-11-24 | |||
| JP2004101849A | 2004-04-02 | |||
| JP2012522264A | 2012-09-20 | |||
| JP2004002778A | 2004-01-08 | |||
| JP2009527126A | 2009-07-23 | |||
| JP2012522068A | 2012-09-20 | |||
| JP2010537231A | 2010-12-02 | |||
| JP2006009006A | 2006-01-12 | |||
| JP2006096984A | 2006-04-13 | |||
| JP2004047980A | 2004-02-12 | |||
| JP2002012897A | 2002-01-15 |
Attorney, Agent or Firm:
SSINPAT PATENT FIRM (JP)
Patent business corporation SSINPAT (JP)
Patent business corporation SSINPAT (JP)
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