Title:
CLEANING A MASK SUBSTRATE
Document Type and Number:
WIPO Patent Application WO2005116758
Kind Code:
A3
Abstract:
This invention relates to a mask cleaning apparatus (101) and a method of cleaning a mask substrate (110). An embodiment according to the invention is a mask cleaning apparatus (101) with a trap comprising a cold trap (120). An additional heater (130) performs the heating function. The mask cleaning apparatus (101) further comprises a support means (105), an aerosol nozzle (150) for blowing aerosol (155) towards the mask substrate (110). In a first stage of the cleaning process the mask substrate (110) is close to the heater (130), and the mask substrate (110) is heated. In a second stage of the cleaning process, the gas flow (170) is stopped, and the mask (110) is transported close to the cold trap (120). The cold trap (120) is cooled. In a third stage of the cleaning process, the aerosol nozzle (150) blows aerosol (155) towards the mask substrate (110), causing particles to become detached from the mask substrate (110). This embodiment uses thermophoretic forces for trapping detached particles. Other embodiments according to the invention use vacuum, electrostatic forces and/or getter metal for trapping detached particles.
Inventors:
RASTEGAR ABBAS (US)
Application Number:
PCT/IB2005/051619
Publication Date:
October 19, 2006
Filing Date:
May 18, 2005
Export Citation:
Assignee:
KONINKL PHILIPS ELECTRONICS NV (NL)
RASTEGAR ABBAS (US)
RASTEGAR ABBAS (US)
International Classes:
G03F1/00; B08B3/02; B08B17/02; H01L21/00
Domestic Patent References:
| WO2002007925A1 | 2002-01-31 |
Other References:
OKADA MASASHI ET AL: "Stencil reticle cleaning using an Ar aerosol cleaning technique", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY. B, MICROELECTRONICS AND NANOMETER STRUCTURES PROCESSING, MEASUREMENT AND PHENOMENA, AMERICAN INSTITUTE OF PHYSICS, NEW YORK, NY, US, vol. 20, no. 1, January 2002 (2002-01-01), pages 71 - 75, XP012009244, ISSN: 1071-1023
DATABASE INSPEC [online] THE INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB; February 1999 (1999-02-01), NARAYANSWAMI N: "A theoretical analysis of wafer cleaning using a cryogenic aerosol", XP002359272, Database accession no. 6206287
DATABASE INSPEC [online] THE INSTITUTION OF ELECTRICAL ENGINEERS, STEVENAGE, GB; February 1999 (1999-02-01), NARAYANSWAMI N: "A theoretical analysis of wafer cleaning using a cryogenic aerosol", XP002359272, Database accession no. 6206287
Download PDF: