Title:
CLEANING METHOD, DEVICE PRODUCTION METHOD, CLEANING SUBSTRATE, IMMERSED MEMBER, IMMERSION EXPOSURE DEVICE, AND DUMMY SUBSTRATE
Document Type and Number:
WIPO Patent Application WO/2012/018051
Kind Code:
A1
Abstract:
In the present invention, a cleaning substrate (CP) and an immersed member (7) are caused to face each other, and the immersed member (7) is cleaned. The cleaning substrate (CP) has: a first liquid-repellant section (51) that is liquid repellant with respect to a first cleaning liquid (LC1) for cleaning; and a lyophilic section (52) that is more lyophilic than the first liquid-repellant section (51) and that is disposed at at least a portion of the periphery of the first liquid-repellant section (51).
Inventors:
TANIMOTO AKIKAZU (JP)
IKEDA YUTAKA (JP)
SHIRAISHI KENICHI (JP)
TANAKA RYO (JP)
WATANABE SHUNJI (JP)
IKEDA YUTAKA (JP)
SHIRAISHI KENICHI (JP)
TANAKA RYO (JP)
WATANABE SHUNJI (JP)
Application Number:
PCT/JP2011/067787
Publication Date:
February 09, 2012
Filing Date:
August 03, 2011
Export Citation:
Assignee:
NIKON CORP (JP)
TANIMOTO AKIKAZU (JP)
IKEDA YUTAKA (JP)
SHIRAISHI KENICHI (JP)
TANAKA RYO (JP)
WATANABE SHUNJI (JP)
TANIMOTO AKIKAZU (JP)
IKEDA YUTAKA (JP)
SHIRAISHI KENICHI (JP)
TANAKA RYO (JP)
WATANABE SHUNJI (JP)
International Classes:
H01L21/027; G03F7/20
Domestic Patent References:
| WO2009116625A1 | 2009-09-24 | |||
| WO2007135990A1 | 2007-11-29 | |||
| WO2008069211A1 | 2008-06-12 |
Foreign References:
| JP2008227449A | 2008-09-25 |
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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