Title:
CLEANING METHOD AND CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2011/142060
Kind Code:
A1
Abstract:
In the disclosed method, a treated object (48) is cleaned by means of jetting a cleaning fluid (5) towards the treated object (48) wherein a metal film (18) having a predetermined pattern is formed on the surface of a substrate (4). During this, by means of jetting a cleaning fluid (5) that contains gaseous micro-nano bubbles (40) having a negative zeta potential, metal oxides (49) having a positive zeta potential formed on the surface (4a) of the substrate (4) are removed.
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Inventors:
TANAKA, Junichi (())
Application Number:
JP2011/000295
Publication Date:
November 17, 2011
Filing Date:
January 20, 2011
Export Citation:
Assignee:
SHARP KABUSHIKI KAISHA (22-22, Nagaike-cho Abeno-ku, Osaka-sh, Osaka 22, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
シャープ株式会社 (〒22 大阪府大阪市阿倍野区長池町２２番２２号 Osaka, 〒5458522, JP)
International Classes:
B08B3/02; H01L21/304; H01L51/50; H05B33/10; G02F1/13
Attorney, Agent or Firm:
MAEDA, Hiroshi et al. (Osaka-Marubeni Bldg, 5-7 Hommachi 2-chome, Chuo-k, Osaka-shi Osaka 53, 〒5410053, JP)
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Claims: