Title:
CLEANING METHOD, METHOD FOR USING CLEANING DEVICE, AND CLEANING DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/057669
Kind Code:
A1
Abstract:
Provided are a method for cleaning an article, a method for using a cleaning device, and a cleaning device, with which fouling can be thoroughly cleaned, with the use of a cleaning solvent that has no adverse impact on the global environment. The method for cleaning an article is characterized by comprising: an immersion step for immersing the article in a solvent composition containing (Z)-1-chloro-3,3,3-trifluoro-1-propene (HCFO-1233zd(Z)); and a vapor contact step for causing a vapor of HCFO-1233zd(Z) to be generated from the solvent composition and exposing the article to the generated vapor. The cleaning device is characterized by comprising: a cleaning tank for accommodating a solvent composition containing HCFO-1233zd(Z) for immersing an article; and a vapor generation tank for generating a vapor to which the article is to be exposed, the vapor generation tank accommodating the solvent composition and causing the vapor to be generated from the solvent composition.
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Inventors:
NAKAMURA MASAHIKO (JP)
MITSUOKA HIROAKI (JP)
MITSUOKA HIROAKI (JP)
Application Number:
PCT/JP2016/079002
Publication Date:
April 06, 2017
Filing Date:
September 30, 2016
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
International Classes:
C23G5/028; B08B3/08; B08B3/12
Foreign References:
US20140206589A1 | 2014-07-24 | |||
JP2014181405A | 2014-09-29 |
Attorney, Agent or Firm:
SAKURA PATENT OFFICE, P.C. (JP)
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