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Patent Searching and Data


Title:
CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2011/078144
Kind Code:
A1
Abstract:
Disclosed is a low-cost and resource-saving cleaning method wherein high cleaning effects are obtained by high-pressure jet cleaning or two-fluid cleaning using a gas-dissolved water. In the high-pressure jet cleaning method or the two-fluid cleaning method, a cleaning liquid or a mixed fluid of the cleaning liquid and a gas is jetted from a cleaning fluid jetting nozzle toward a subject to be cleaned, and the subject is cleaned. The cleaning liquid introduced into the cleaning fluid jetting nozzle contains the dissolved gas in a quantity equal to or more than the saturation solubility at the liquid temperature of the cleaning liquid.

Inventors:
TOKOSHIMA HIROTO (JP)
MORITA HIROSHI (JP)
Application Number:
PCT/JP2010/072955
Publication Date:
June 30, 2011
Filing Date:
December 21, 2010
Export Citation:
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Assignee:
KURITA WATER IND LTD (JP)
TOKOSHIMA HIROTO (JP)
MORITA HIROSHI (JP)
International Classes:
H01L21/304; H01L21/027
Foreign References:
JP2001345301A2001-12-14
JP2002151459A2002-05-24
Attorney, Agent or Firm:
SHIGENO, Tsuyoshi (JP)
Takeshi Shigeno (JP)
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