Title:
CLEANING METHOD
Document Type and Number:
WIPO Patent Application WO/2016/152142
Kind Code:
A1
Abstract:
In a jig used in a CVD device or a dry etching device, processing in a chamber causes adhesion of an accumulated film. When ignored, the accumulated film is a factor in reduced spark generation and precision, and quality degradation such as particle contamination. The present invention is a method for cleaning the jig of a vacuum processing device, the cleaning method characterized by including a step for immersing the jig in a tetramethylammonium hydroxide solution, a step for immersing the jig in a nitric acid solution, and a step for cleaning the jig using purified water.
Inventors:
FUCHIGAMI SHINICHIROU
MINAMI TOSHIHIKO
UMEDA YASUSHI
MINAMI TOSHIHIKO
UMEDA YASUSHI
Application Number:
PCT/JP2016/001637
Publication Date:
September 29, 2016
Filing Date:
March 22, 2016
Export Citation:
Assignee:
PANASONIC IP MAN CO LTD (JP)
International Classes:
C23C16/44; H01L21/205; H01L21/3065
Foreign References:
| JP2008522434A | 2008-06-26 | |||
| JP2013514173A | 2013-04-25 |
Attorney, Agent or Firm:
HIROKOH, MASAKI (JP)
Hiroyuki Masaki (JP)
Hiroyuki Masaki (JP)
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