Title:
CLEANING SOLUTION AND MANUFACTURING METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2015/029263
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a cleaning solution, which has high stability, produces a high concentration of hypochlorous acid during cleaning, and has bacteria- and virus-killing and cleaning effects. A means for solving said problem is an aqueous solution comprising hypochlorous acid and hypochlorous acid ions produced by diaphragm-free electrolysis. The available residual chlorine concentration being adjusted to 500 ppm to 2000 ppm and the hydrogen ion concentration index to pH 8.5 - pH 9.5 creates a cleaning solution, which is stable over long periods while exhibiting high microbicidal and cleaning effects when used.
Inventors:
SHICHITANI YASUO (JP)
Application Number:
PCT/JP2013/074600
Publication Date:
March 05, 2015
Filing Date:
August 30, 2013
Export Citation:
Assignee:
EPIOS CO LTD (JP)
International Classes:
A61K8/19; C02F1/46; A61K33/00; A61P1/02; A61P31/04; A61P31/12; A61Q11/00; C02F1/50; C25B1/26
Domestic Patent References:
| WO2003057261A1 | 2003-07-17 |
Foreign References:
| JP2011132205A | 2011-07-07 | |||
| JP2008260740A | 2008-10-30 | |||
| JP2009029792A | 2009-02-12 | |||
| JP2007530731A | 2007-11-01 |
Attorney, Agent or Firm:
HASHIMOTO, KATSUHIKO (JP)
Katsuhiko Hashimoto (JP)
Katsuhiko Hashimoto (JP)
Download PDF: