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Title:
CLEANROOM SYSTEM FOR SEMICONDUCTOR MANUFACTURING AND ELECTRIC FIELD-BASED DUST REMOVAL METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2020/216355
Kind Code:
A1
Abstract:
A cleanroom system for semiconductor manufacturing, comprising a cleanroom (101) and an electric field-based dust removal system (102). The cleanroom (101) comprises a gas inlet. The electric field-based dust removal system (102) comprises a dust removal system outlet and an electric field apparatus (1021). The gas inlet of the cleanroom is connected to the dust removal system outlet of the electric field-based dust removal system (102). The electric field apparatus (1021) comprises an electric field apparatus inlet (1011), an electric field apparatus outlet, an electric field cathode (5081) and an electric field anode (5082), the electric field cathode (5081) and the electric field anode (5082) being used to generate an ionizing electric field. The electric field apparatus (1021) further comprises an auxiliary electric field unit, used to generate an auxiliary electric field that is not parallel to the ionizing electric field. Further comprised is a corresponding electric field-based dust removal method, a semiconductor manufacturing system, and a semiconductor manufacturing method, able to effectively remove particulate matter in the manufacture of semiconductors.

Inventors:
TANG WANFU (CN)
ZHAO XIAOYUN (CN)
WANG DAXIANG (CN)
DUAN ZHIJUN (CN)
ZOU YONGAN (CN)
XI YONG (CN)
Application Number:
PCT/CN2020/086850
Publication Date:
October 29, 2020
Filing Date:
April 24, 2020
Export Citation:
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Assignee:
SHANGHAI BIXIUFU ENTERPRISE MAN CO LTD (CN)
International Classes:
F24F7/06; B03C3/02
Foreign References:
JPH0498034A1992-03-30
CN2205248Y1995-08-16
CN106504994A2017-03-15
CN105689140A2016-06-22
CN205966185U2017-02-22
CN102671763A2012-09-19
CN201006047Y2008-01-16
CN1583281A2005-02-23
JP2001179127A2001-07-03
Attorney, Agent or Firm:
SHANGHAI QIHE INTELLECTUAL PROPERTY AGENCY CO., LTD. (CN)
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