CMP CONDITIONER AND PROCESS FOR PRODUCING THE SAME

Title:

CMP CONDITIONER AND PROCESS FOR PRODUCING THE SAME

Document Type and Number:

WIPO Patent Application WO/2008/038583

Kind Code:

A1

Abstract:

[PROBLEMS] To provide a CMP conditioner having excellent corrosion resistance around abrasive grains. [MEANS FOR SOLVING PROBLEMS] A grindstone base having, formed on one side, an abrasive grain layer comprising a metallic bonding phase and abrasive grains fixed thereto is treated to form a first protective layer comprising an oxide on the surface of the metallic bonding phase of the abrasive grain layer by the sol-gel method. Subsequently, an aerosol obtained by dispersing fine particles of a brittle material in a gas is jetted and caused to strike on the surface of the first protective layer to form a second protective layer comprising a thick oxide film.

Inventors:

YAMASHITA TETSUJI (JP)
RIKITA NAOKI (JP)
KIMURA TAKASHI (JP)
OGYU MASAHARU (JP)
ASHIZAWA HIROAKI (JP)
HATONO HIRONORI (JP)
TOKITA MASAHIRO (JP)

Application Number:

PCT/JP2007/068356

Publication Date:

April 03, 2008

Filing Date:

September 21, 2007

Export Citation:

Click for automatic bibliography generation Help

Assignee:

MITSUBISHI MATERIALS CORP (JP)
TOTO LTD (JP)
YAMASHITA TETSUJI (JP)
RIKITA NAOKI (JP)
KIMURA TAKASHI (JP)
OGYU MASAHARU (JP)
ASHIZAWA HIROAKI (JP)
HATONO HIRONORI (JP)
TOKITA MASAHIRO (JP)

International Classes:

B24B53/12; B24B37/00; B24D3/00; H01L21/304

Foreign References:

JP2003309094A	2003-10-31
JPH1058306A	1998-03-03
JP2001210613A	2001-08-03
JP2005177979A	2005-07-07
JP2007109767A	2007-04-26
JP2007260886A	2007-10-11

Attorney, Agent or Firm:

KOYAMA, Yuu (Furuya Bldg.3-29, Kioicho, Chiyoda-ku, Tokyo 94, JP)

Download PDF:

View/Download PDF PDF Help

Previous Patent: AIR CONDITIONER

Next Patent: BASE MATERIAL FOR SOLID ELECTROLYTIC CAPACITOR, CAPACITOR USING THE BASE MATERIAL, AND METHOD FOR MA...