CMP PAD WITH COMPOSITE TRANSPARENT WINDOW - CABOT MICROELECTRONICS CORP

Title:

CMP PAD WITH COMPOSITE TRANSPARENT WINDOW

Document Type and Number:

WIPO Patent Application WO2004069470

Kind Code:

A3

Abstract:

The invention is directed to chemical-mechanical polishing pads comprising a transparent window comprising a polymer resin having a first index of refraction and an inorganic material having a second index of refraction. The transparent window has a light transmittance of 10% or more at a wavelength of 200nm to 10,000 nm. The difference between the first index of refraction and the second index of refraction is 0.3 o less at the wavelength.

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Inventors:

MANNING MONIS M

Application Number:

PCT/IB2004/000343

Publication Date:

September 16, 2004

Filing Date:

February 09, 2004

Export Citation:

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Assignee:

CABOT MICROELECTRONICS CORP (US)

International Classes:

B24B37/013; B24B37/20; B24D3/28; B24D3/34; (IPC1-7): B24B37/04; B24D3/28; B24D3/34

Domestic Patent References:

WO2001068322A1

2001-09-20

Foreign References:

US20010053658A1	2001-12-20
US20010034197A1	2001-10-25

Other References:

PATENT ABSTRACTS OF JAPAN vol. 2003, no. 03 5 May 2003 (2003-05-05)

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