COATING COMPOSITION FOR FORMING HARD COATING LAYER, METHOD FOR PRODUCING SAME, SUBSTRATE WITH HARD COATING LAYER, AND METHOD FOR PRODUCING SAME

Title:

COATING COMPOSITION FOR FORMING HARD COATING LAYER, METHOD FOR PRODUCING SAME, SUBSTRATE WITH HARD COATING LAYER, AND METHOD FOR PRODUCING SAME

Document Type and Number:

WIPO Patent Application WO/2022/230864

Kind Code:

A1

Abstract:

[Problem] To provide, for example, a coating composition for forming a hard coating layer which makes it possible to, without deteriorating the quality of a hard coating layer to be obtained, reduce the heating time required to cure a coating film and form the hard coating layer. [Solution] A coating composition for forming a hard coating layer comprises: surface-coated inorganic oxide microparticles which are obtained by coating the surfaces of inorganic oxide microparticles with quaternary alkoxysilane; a hydrolysate of an organic silicon compound having an epoxy group and/or a condensate thereof; 1,2,3,4-butanetetracarboxylic acid; and a curing agent, wherein the number average molecular weight of the hydrolysate and/or the condensate thereof is 80-500, and the content of the 1,2,3,4-butanetetracarboxylic acid is 8-25 parts by mass with respect to 100 parts by mass of the surface-coated inorganic oxide microparticles.

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Inventors:

SHIMIZU TAKEHIRO (JP)
IKEMATSU TAKAFUMI (JP)
MURAGUCHI RYO (JP)

Application Number:

PCT/JP2022/018855

Publication Date:

November 03, 2022

Filing Date:

April 26, 2022

Export Citation:

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Assignee:

JGC CATALYSTS & CHEMICALS LTD (JP)

International Classes:

C09D5/00; C09D7/62; C09D7/63; C09D183/04

Foreign References:

JP2010270191A	2010-12-02
JP2015160885A	2015-09-07
JP2014208743A	2014-11-06
JP2015143297A	2015-08-06
JP2011132484A	2011-07-07
JP2000206305A	2000-07-28
JP2003138211A	2003-05-14
JP2010202842A	2010-09-16
JP2016204433A	2016-12-08
JPH05264806A	1993-10-15
JP3203142B2	2001-08-27
JP2000204301A	2000-07-25
JP2002363442A	2002-12-18
JP2783417B2	1998-08-06

Attorney, Agent or Firm:

SSINPAT PATENT FIRM (JP)

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