COATING COMPOSITION FOR PATTERN INVERSION

WIPO Patent Application WO/2018/066515

A1

[Problem] To provide a pattern-inversion coating composition that is not only for filling spaces within a pattern of an organic underlayer film to which a resist pattern formed over a substrate to be processed has been transferred, but also for forming a flat film. [Solution] A coating composition which is to be applied to an organic underlayer film to which a resist pattern has been transferred, the coating composition containing a polysiloxane formed by reacting an alcohol with silanol groups of a product of the hydrolysis and condensation of one or more hydrolyzable silanes, 50-100 mol% of which are accounted for by a hydrolyzable silane having four hydrolyzable groups in the molecule. The hydrolyzable silanes are represented by formula (1): R1 aSi(R2)4-a, and comprise 50-100 mol% hydrolyzable silane in which a is 0 and 0-50 mol% hydrolyzable silane in which a is 1 or 2. The alcohol is propylene glycol monomethyl ether, propylene glycol monoethyl ether, or 3-methoxybutanol.

YAGUCHI HIROAKI (JP)
NAKAJIMA MAKOTO (JP)
ENDO YUKI (JP)
SHIBAYAMA WATARU (JP)
SHIGAKI SHUHEI (JP)

PCT/JP2017/035827

April 12, 2018

October 02, 2017

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NISSAN CHEMICAL IND LTD (JP)

C09D183/04; B05D1/32; B05D1/36; B05D3/10; B05D7/00; B05D7/24; G03F7/40; H01L21/027

WO2016031563A1

2016-03-03

JP2009128564A	2009-06-11
JP2015038221A	2015-02-26
JP2001033949A	2001-02-09
JP2011118373A	2011-06-16

HANABUSA PATENT & TRADEMARK OFFICE (JP)

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